Make in India Partners
Semiconductor
Nano Technology
Wet Bench – नमी
With complex chemistries in action for semiconductor processes, it is imperative to provide greater flexibility for taking the substrates through multiple chemistries. This involves high and low temperatures, cleaning using Ultrasound, DI water and drying with ultra pure Nitrogen. Wet Benches with nearly zero human interface becomes critical for successful semiconductor processes.
Application
- Configurable for safe storage and handling of chemicals like TCE, Acetone IPA, HF, Pirana, RCAs, H2SO4, KOH, CP4, POCL, HCL DI water etc.
Tanks
- Single tank
- Multi tank
Version
- Manual,
- Automatic
Compliance
- SEMI S2
- FM4910
Additional
- OEM’s Pre-start up training program
Utilities requirements
- Gen N2 @2 Bar for gun
- DI Water for gun
- Power: 240VAC, 50Hz,
- Exhaust 300 cfm to 800 cfm @ 1.5″ WC
- Exhaust Duct – 2” to 8”
Options
- Ultrasonic agitation
- Drying
- Heating / Cooling
- Magnetic Stirring
- Motorised exhaust dampers,
- Microprocessor control system with HMI
- Recipe management software.
Standard configuration
- Samples/wafers Size: 1” to 16”
- Cleaning tank Size: to accommodate wafer size from 1” to 16” with holder
- Number of tanks: as per requirement.
- Work surface: SS304 /PTFE with shield in front of the work area
- Tank Material: PP/ PTFE / PVDF / SS304
- Access shields: Acrylic/Clear PVC. Customization available to raised and lower for operator safety and control laminar air flow.
- Quick Dump rinse.
