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Semiconductor

Nano Technology

Gas Purification – सत्व
Many applications are progressing towards measuring its success and efficiency owing to better purity of gases being made available to customers. In this journey, KAS has come up with multiple solutions to remove the impurities from the main stream gas. The output gas meets semiconductor industry requirements of sub-ppb impurities

Application
- Configurable for safe purification (High Pure and Ultra High Pure) of CORT gases (Corrosive, Oxidizing, Reactive and Toxic)

Testing and Validation
- Helium leak tested exceeding 1 X 10-9 He L/sec
- Pressure tested as per ASME B31.3

Version
- Semi-Automatic
- Automatic

Compliance
- IS 2825, ASME Section VIII Div 1, PESO, NEC & IEC Zone System Gas & Dust Groups – Area: Zone 0,1 & 2 & Group IIC (includes C2H2 & H2 gas service)

Additional
- OEM’s Pre-start up training program

Options
- Excess Flow switch, Process Gas MFC or MFM w/totalizer
- TGM Service / AMC Service
- FMEA/HAZOP

Utilities requirements
- UHP Nitrogen @ 7 bar for Pneumatic Actuation / Purge
- Calibration Gases
- Water for Sprinklers

Standard configuration
- Highly Compact Skid Mounted system
- Catalytic Reactor with Suitable Media
- Twin Dryer Towers or Multiple Dryer Towers
- Gas analyzers with Calibration Gas panels
- Back Pressure Regulators
- Intermediate Storage Vessel for purified gas
- Safety Relief v/v, Emergency Shut Off v/v
- Controller – Life Safety System, TCP/IP compatible,
- Gas Leak Detection system, Heat Detection system