Make in India Partners
Semiconductor
Nano Technology
CVD – सागर
World is anticipating new wonder material to bring in positive influence on humans. Our OCEAN CVD platform is one such hope for scientific community. This provides 5X faster development platform to derive new 2D materials.
Foot Print
- Standard: 1150mm (L) X 920mm (W) X 1240mm (H)
- With Options: 1700mm(L) X 1200mm(W) X 1240mm(H)
Temperature
- 1100 Deg C (Operating) / 1250 Deg C (Maximum)
Heating zone
- Uniformity over 200 mm
Substrate Size
- 2.5″ X 12″ (Roll)
- 40 mm X 60 mm – single substrate
Power
- 240V, 16A, 50 Hz
Ramp-up Rate
- 20 Deg C/Min
Pressure
- 1 mbar (ultimate vacuum)
Cycle time
- 240 min for manual version
- 45 mins automated version
Standard Configuration
- Gas Manifold with MFC
- Run & Vent line switch for pressure stabilisation
- Automatic pressure control with throttle valve
- User driven Recipe management software
- Gas Safety System
Options
- Detachable Gas Delivery system
- Automatic Substrate transfer system
- Load Lock chamber
- Precursor Purifier
- Inbuilt Valve Manifold for multiple gas outlets, Electronic Regulators
- Bubbler for Liquid precursor
- Vent gas abatement Scrubber
